The Major research activities in nano fabrication laboratory (NFL) are focused into two important technologies in materials science and engineering, which are nanotechnology and thin-film technology. For the contribution in nanotechnology, the key technology, the quantum dot formation is investigated by two major methods to form quantum dot, which are top-down and bottom-up approaches. Specifically, the brand-new electron projection lithography technique, the atomic image projection electron lithography (AIPEL) process has been developed to form quantum dots, which have the controllable size distribution, good alignment and large throughput with the partnership of JEOL. AIPEL process is based on the principle of high resolution transmission electron microscopy (HRTEM) using the atomic image of materials in nature. The extinguishing feature of AIPEL process is the mix and match process of the top-down (lithography) and bottom-up (atomic image) process. In bottom-up approaches the self-assembled nanoparticles has been investigated using various colloidal nanoparticles, which are -Fe2O3, CdSe and FePt. The formation of self-assembled monolayer of nanoparticles by multiple adsorption process was investigated. The practical application to functional nano-electronic, nano-magnetic, or nano-photonic devices using monolayer of nanoparticles has studied.