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    국내학술지 제목 게시판 내용
    제목(국문) 반도체 공정에서의 APC 기법 및 이상감지 및 분류 시스템
    제목(영문) APC Technique and Fault Detection and Classification System in Semiconductor Manufacturing Process
    저자 하대근 (Daegeun Ha ,서울대학교 화학생물공학부 ) ▷공저자네트워크등록하기
    구준모 (Jun-Mo KOO ,School of Chemical and Biological Engineering, Seoul National University ) ▷공저자네트워크등록하기
    박담대 (Dam-Dae Park ,School of Chemical and Biological Engineering, Seoul National University ) ▷공저자네트워크등록하기
    한종훈 (Chonghun Han ,서울대학교 화학생물공학부 ) ▷공저자네트워크등록하기
    초록
    초록(영문)
    Traditional semiconductor process control has been performed through statistical process control techniques in a constant process-recipe conditions. However, the complexity of the interior of the etching apparatus plasma physics, quantitative modeling of process conditions due to the many difficult features constraints apply simple SISO control scheme. The introduction of the Advanced Process Control (APC) as a way to overcome the limits has been using the APC process control methodology run-to-run, wafer-to-wafer, or the yield of the semiconductor manufacturing process to the real-time process control, performance, it is possible to improve production. In addition, it is possible to establish a hierarchical structure of the process control made by the process control unit and associated algorithms and etching apparatus, the process unit, the overall process. In this study, the research focused on the methodology and monitoring improvements in performance needed to consider the process management of future developments in the semiconductor manufacturing process in accordance with the age of the APC analysis in real applications of the semiconductor manufacturing process and process fault diagnosis and control techniques in progress
    keyword semiconductor manufacturing, Advanced Process Control (APC), fault diagnosis, Fault Detection and Classification
    (FDC), Virtual Metrology (VM)
    저널명 제어로봇시스템학회논문지 ▷관련저널보기
    VOL 21
    PAGE 0875
    발표년도 2015
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