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Study on the effect of ceria concentration on the silicon oxide removal rate in chemical mechanical planarization
Study on the effect of ceria concentration on the silicon oxide removal rate in chemical mechanical planarization
Donggeon Kwak, Seungjun Oh, Juhwan Kim, Junho Yun, and Taesung Kim, 2020-10, Vol. 0, No. 125670, pp. 0~ 0
Donggeon Kwak, Seungjun Oh, Juhwan Kim, Junho Yun, and Taesung Kim
Recyclable free-polymer transfer of nano-grain MoS2 film onto arbitrary substrates
Nanotechnology, 2020-10, Vol. 32, No. 4, pp. 0~ 0
Yujin Choa, Hoomi Choi, Sung won Mo, Taesung Kim
Removal of nano-sized surface particles by CO2 gas cluster collisions for dry cleaning
Microelectronic Engineering, 2020-10, Vol. 234, No. 15, pp. 111438~ 0